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Chemical Vapor Deposition (journal) : ウィキペディア英語版 | Chemical Vapor Deposition (journal)
''Chemical Vapor Deposition'' is a monthly peer-reviewed scientific journal covering materials science. It publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. Frequent topics covered by the journal also include inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing. == References ==
抄文引用元・出典: フリー百科事典『 ウィキペディア(Wikipedia)』 ■ウィキペディアで「Chemical Vapor Deposition (journal)」の詳細全文を読む
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